Sputtering target made by tungsten alloy and tungsten is widely used in semiconductor and electronic technology.

The semiconductor and electronic technology is the foundation of modern technology. Transistor and complex circuit formed on silicon substrate by magnetron sputtering coating technology, which is the most basic processing procedure in chip and various types of electronic devices. Magnetron sputtering target made of tungsten and tungsten alloys become the indispensable material in electronic technology field. Because it has stable physical and chemical properties, high melting point, high electrical conductivity, high electromigration resistance and excellent step coverage performance, and its work function is close to the band gap of silicon. Magnetron sputtering target made of tungsten and tungsten alloys have wide application In semiconductor technology, especially the large scale integrated circuit (LSI), photovoltaic (PV) and other fields.

At present, the rapid development of LED lighting technology, the sapphire substrate production process needs high temperature resistant and long-life material as the crucible, heater, heat shield, at present in this field, only tungsten and molybdenum material can meet the requirements.